Altus Lot Viewer
Lot history analysis.
Lot history and reactor resultsARTIFACTS / 19 APPLICATIONS BUILT AGAINST INEFFICIENCY
Pentimento Edition

PentimentoEdition
The thinking behind the tools
ARTIFACTS begins with a simple principle: understand what needs to work better, then build what makes it possible.The result: an engineering ecosystem defined not by the tools it contains, but by the standard of work they make possible.
FIG. 01FRICTION
Every tool begins with something that should work better: a repeated task, a difficult comparison, a hidden dependency, or a decision carrying too much manual effort.
Turn repetition into a system.
FIG. 02STRUCTURE
Capture the checks that matter. Automate what does not need human attention. Preserve the context needed for the decisions that do.
Let the work guide what comes next.
FIG. 03REFINEMENT
Put the evidence, context, and next action where they can be understood together. Use the tool. Challenge it. Improve it as the process, data, and requirements change.
Keep improving through the work.
The collection
19 purpose-built applications
Lot history analysis.
Lot history and reactor resultsANKO schedule retrieval.
ANKO schedule and due datesReactor wafer counts against loading limits.
Reactor loading and wafer countsContour and topography plots.
Interpolated 3D surfaceXML, EPI, and text reader.
Exhaustive XML comparisonSPC chart finder.
Equipment and parameter chart indexMetrology report compiler.
Plessey input validation and XRD readinessTemperature drift diagnosis.
Temperature drift diagnosisBaseplate assignment from weights and temperature differences.
Weight-based assignmentLayTec zone mapping.
Inner and outer measurement zonesDevices.XML comparison.
Device comparisonGaN SPC release review.
GaN release summaryLegacy SPC release review.
Legacy release summaryANKO status and due dates.
ANKO status and next serviceLayTec report compilation.
Compiled LayTec analysis reportsInteractive multi-parameter equipment SPC.
Multi-parameter trendsContext-aware metrology SPC, analysis, and distributions.
Metrology trendsEngineering data exploration and wafer maps.
Parameter relationshipsProduction-tool signals, equipment history, and sensor analysis.
Equipment overview